2019-09-17   Supply and Maintenance of a Dual Beam Plasma Focused Ion Beam โ€” Field Emission Scanning Electron Microscope (European Commission, JRC โ€” Joint Research Centre, JRC.G โ€” Nuclear Safety and Security (Karlsruhe), JRC.G.I.4 โ€” Nuclear Reactor S)
In order to perform in-situ large area contamination-free sample preparation and high resolution imaging and analysis, the JRC Petten plans to purchase a dual beam microscope (pFIB-SEM) featuring a Xenon plasma as ion beam source (pFIB) and a field emission electron beam as source for electron imaging. The pFIB/SEM infrastructure will support scientific activities in nuclear safety and in medical applications of nuclear science. For that purpose, the system will include energy dispersive X-ray (EDX), โ€ฆ Bekijk de aanbesteding ยป
Genoemde leveranciers: FEI Europe BV
2019-05-27   Supply and Maintenance of a Dual Beam Plasma Focused Ion Beam โ€” Field Emission Scanning Electron Microscope (pFIB โ€” SEM) (European Commission, JRC โ€” Joint Research Centre, JRC.G โ€” Nuclear Safety and Security (Karlsruhe), JRC.G.I.4 โ€” Nuclear Reactor S)
In order to perform in-situ large area contamination-free sample preparation and high resolution imaging and analysis, the JRC Petten plans to purchase a Dual Beam microscope (pFIB-SEM) featuring an inductively coupled plasma as ion beam source (pFIB) and a field emission electron beam as source for electron imaging. The pFIB/SEM infrastructure will support scientific activities in nuclear safety and in medical applications of nuclear science. For that purpose, the system will include energy dispersive โ€ฆ Bekijk de aanbesteding ยป
2012-07-06   Three-Dimensional Atom Probe System (3DAP) (Technische Universiteit Eindhoven (Eindhoven University of Technology))
Three-Dimensional Atom Probe System (3DAP), instrument of laser assisted atom probe tomography. Bekijk de aanbesteding ยป
2011-12-13   Supply of a low energy ion scattering instrument (LEIS system) (FOM Institute for Plasma Physics Rijnhuizen)
The nSI department of FOM is looking to purchase an LEIS system for quantitative analysis of in-situ deposited layers. In this context, the term โ€œin-situโ€ is used to indicate that the layers are deposited in an integrated instrument such that samples can be transferred between deposition and analysis points quickly (minutes) and without exposure to atmospheric conditions. Examples of processes will be studied with the LEIS system include layer growth, material intermixing, and surface contamination. The โ€ฆ Bekijk de aanbesteding ยป
Genoemde leveranciers: ION-TOF GmbH