2026-06-12   Deadline 2026-08-14   European Tender Electron Beam Lithography system (Universiteit Twente)
The University of Twente is tendering to purchase an Electron Beam Lithography system. The MESA+ Institute of the University of Twente will invest in a new Electron Beam system (e-beam system). A system, suitable for defining patterns in electron sensitive resists, at high resolution and high speed, compatible with a wide range of applications and substrate types up to 200mm in diameter. The system will be used by a wide range of users, i.e. academic researchers and students as well as industrial โ€ฆ Bekijk de aanbesteding ยป