The MESA+ Institute will invest in a UHV Sputter system to replace the current UHV Sputter systems with a state-of-the-art system that will bring more advanced process control and better process conditions (by means of a UHV system) to the lab. The system will be used for the deposition of metals onto various samples that have been processed in one or more deposition / lithography steps within the NanoLab facilities. Among these depositions, we outline a few below: Deposition of Au layers for good electrical contact to electronic devices (typically combined with a Ti interlayer for improved adhesion of the deposited film). Deposition of Nb layers for superconducting quantum devices such as Josephson junctions or SQUID devices (typically combined with a Pd capping layer). The system will furthermore enable users to etch the samples prior to the deposition, so that the surface of the sample can be cleaned to improve interface transparency in between the deposited layers and the ex-situ layers that have been prepared in other tools prior to loading the samples in the UHV Sputter system.
Deadline
De termijn voor de ontvangst van de offertes was 2024-05-06.
De aanbesteding werd gepubliceerd op 2024-03-22.
Aankondiging van een opdracht (2024-03-22) Object Toepassingsgebied van de aanbesteding
Titel: UHV Sputter system
Referentienummer: EB-OUT 6272
Korte beschrijving:
“The MESA+ Institute will invest in a UHV Sputter system to replace the current UHV Sputter systems with a state-of-the-art system that will bring more...”
Korte beschrijving
The MESA+ Institute will invest in a UHV Sputter system to replace the current UHV Sputter systems with a state-of-the-art system that will bring more advanced process control and better process conditions (by means of a UHV system) to the lab.
The system will be used for the deposition of metals onto various samples that have been processed in one or more deposition / lithography steps within the NanoLab facilities. Among these depositions, we outline a few below:
Deposition of Au layers for good electrical contact to electronic devices (typically combined with a Ti interlayer for improved adhesion of the deposited film).
Deposition of Nb layers for superconducting quantum devices such as Josephson junctions or SQUID devices (typically combined with a Pd capping layer).
The system will furthermore enable users to etch the samples prior to the deposition, so that the surface of the sample can be cleaned to improve interface transparency in between the deposited layers and the ex-situ layers that have been prepared in other tools prior to loading the samples in the UHV Sputter system.
Toon meer
Soort contract: Leveringen
Producten/diensten: Laboratoriuminstrumenten, optische en precisie-instrumenten (uitgezonderd brillen)📦
Geschatte waarde exclusief BTW: 415 000 EUR 💰
Beschrijving
Beschrijving van de aanbesteding:
“The MESA+ Institute will invest in a UHV Sputter system to replace the current UHV Sputter systems with a state-of-the-art system that will bring more...”
Beschrijving van de aanbesteding
The MESA+ Institute will invest in a UHV Sputter system to replace the current UHV Sputter systems with a state-of-the-art system that will bring more advanced process control and better process conditions (by means of a UHV system) to the lab.
The system will be used for the deposition of metals onto various samples that have been processed in one or more deposition / lithography steps within the NanoLab facilities. Among these depositions, we outline a few below:
Deposition of Au layers for good electrical contact to electronic devices (typically combined with a Ti interlayer for improved adhesion of the deposited film).
Deposition of Nb layers for superconducting quantum devices such as Josephson junctions or SQUID devices (typically combined with a Pd capping layer).
The system will furthermore enable users to etch the samples prior to the deposition, so that the surface of the sample can be cleaned to improve interface transparency in between the deposited layers and the ex-situ layers that have been prepared in other tools prior to loading the samples in the UHV Sputter system.
Toon meer
Hoofdlocatie of plaats van uitvoering:
“Zie documentatie” Titel
Identificatienummer van de partij: LOT-0000
Procedure Soort procedure
Open procedure ✅ Administratieve informatie
Termijn voor de ontvangst van inschrijvingen of verzoeken tot deelneming: 2024-05-06 10:00:00 📅
Voorwaarden voor de opening van de offertes: 2024-05-07 00:00:00 📅
Talen waarin inschrijvingen of aanvragen tot deelneming kunnen worden ingediend: Engels 🗣️
Talen waarin inschrijvingen of aanvragen tot deelneming kunnen worden ingediend: Nederlands 🗣️
Juridische, economische, financiële en technische informatie Economische en financiële draagkracht
Lijst en korte beschrijving van de selectiecriteria:
“Zie beschrijvend document”
Aanvullende informatie Beoordelingsorgaan
Naam: Rechtbank Overijssel
Nationaal registratienummer: 82940525
Poststad: Almelo
Land: Nederland 🇳🇱
E-mail: communicatie.rb-ove@rechtspraak.nl📧
Telefoon: (+31)0883611042📞 Informatie over elektronische workflows
Elektronische facturering wordt aanvaard
Er zal gebruik worden gemaakt van elektronische betaling
Bron: OJS 2024/S 060-178655 (2024-03-22)
Aankondiging van een opdracht (2024-04-03) Object Toepassingsgebied van de aanbesteding
Geschatte waarde exclusief BTW: 415 000 EUR 💰
Gunningscriteria
Kwaliteitscriterium (naam): Wishes
Kwaliteitscriterium (weging): 30
Prijs ✅
Prijs (weging): 10
Procedure Administratieve informatie
Termijn voor de ontvangst van inschrijvingen of verzoeken tot deelneming: 2024-05-14 10:00:00 📅
Voorwaarden voor de opening van de offertes: 2024-05-15 00:00:00 📅
Bron: OJS 2024/S 068-201829 (2024-04-03)
Aankondiging van een opdracht (2024-04-05) Object Toepassingsgebied van de aanbesteding
Geschatte waarde exclusief BTW: 415 000 EUR 💰
Bron: OJS 2024/S 069-204548 (2024-04-05)